发明名称 Method to prevent side lobe on seal ring
摘要 A new method is provided for the creation of a seal ring or fuse ring over the surface of a Phase Shift Mask. A seal ring pattern is created over the surface of a phase shift mask through a layer of phase shift material and a layer of opaque material. The seal ring is surrounded by a layer of opaque material by etching the layer of opaque material.
申请公布号 US6858354(B1) 申请公布日期 2005.02.22
申请号 US20020255482 申请日期 2002.09.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY 发明人 HSIEH HUNG-CHANG;HUNG CHANG-CHENG
分类号 G03F1/00;G03F9/00;H01L21/027;(IPC1-7):G03F9/00 主分类号 G03F1/00
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