发明名称 |
Method to prevent side lobe on seal ring |
摘要 |
A new method is provided for the creation of a seal ring or fuse ring over the surface of a Phase Shift Mask. A seal ring pattern is created over the surface of a phase shift mask through a layer of phase shift material and a layer of opaque material. The seal ring is surrounded by a layer of opaque material by etching the layer of opaque material.
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申请公布号 |
US6858354(B1) |
申请公布日期 |
2005.02.22 |
申请号 |
US20020255482 |
申请日期 |
2002.09.26 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY |
发明人 |
HSIEH HUNG-CHANG;HUNG CHANG-CHENG |
分类号 |
G03F1/00;G03F9/00;H01L21/027;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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