| 发明名称 |
Focus determination method and device manufacturing method |
| 摘要 |
One or more focus settings for use in a device manufacturing method is determined by printing a plurality of target markers at different focus settings on a test substrate, and using a scatterometer, e.g. off-line, to measure a property of the target markers that is indicative of focus. |
| 申请公布号 |
EP1739491(A1) |
申请公布日期 |
2007.01.03 |
| 申请号 |
EP20060253169 |
申请日期 |
2006.06.20 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER SCHAAR, MAURITS;DEN BOEF, ARIE JEFFREY;DUSA, MIRCEA;KIERS, ANTOINE GASTON MARIE |
| 分类号 |
G03F7/20;G01N21/47 |
主分类号 |
G03F7/20 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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