COMPOUND, RESIN, RESIST COMPOSITION, AND PRODUCTION METHOD OF RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a compound having good resolution and useful for microfabrication of a semiconductor, and a resin and a resist composition using the compound.SOLUTION: The compound is represented by formula (I). The resin comprises a structural unit derived from the compound represented by the formula (I). The resist composition comprises the resin and an acid generator. [In the formula (I), Rand Reach independently represent a group having a cyclic acid-labile group.]SELECTED DRAWING: None