发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
Provided is a technology for further reducing a loss in a semiconductor device including a semiconductor substrate in which an IGBT region and a diode region are provided. This semiconductor device includes a semiconductor substrate in which at least one IGBT region and at least one diode region are provided. The IGBT region and the diode region are adjacent to each other in a predetermined direction in a plan view of the semiconductor substrate. In the plan view of the semiconductor substrate, a first boundary plane where the collector region and the cathode region are adjacent is shifted from a second boundary plane where the IGBT region and the diode region are adjacent on the front surface side of the semiconductor substrate either in a direction from the cathode region toward the collector region or in a direction from the collector region toward the cathode region. |
申请公布号 |
US2016247808(A1) |
申请公布日期 |
2016.08.25 |
申请号 |
US201315027846 |
申请日期 |
2013.11.05 |
申请人 |
HORIUCHI Yuki;KAMEYAMA Satoru |
发明人 |
HORIUCHI Yuki;KAMEYAMA Satoru |
分类号 |
H01L27/105;H01L29/08;H01L29/739 |
主分类号 |
H01L27/105 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising a semiconductor substrate in which at least one IGBT region and at least one diode region are provided, wherein
the IGBT region comprises: a first conductivity type emitter region disposed in an area exposed on a front surface of the semiconductor substrate; a second conductivity type base region surrounding the emitter region and in contact with the emitter region; a first conductivity type first drift region disposed on a back surface side of the semiconductor substrate with respect to the base region, and being separated from the emitter region by the base region; a gate electrode disposed in a trench penetrating the base region to extend to the first drift region, and facing a part of the base region which separates the emitter region from the first drift region; an insulating body disposed between the gate electrode and an inner wall of the trench; and a second conductivity type collector region disposed in an area exposed on a back surface of the semiconductor substrate, the diode region comprises: a second conductivity type anode region disposed in an area exposed on the front surface of the semiconductor substrate; a first conductivity type second drift region disposed on the back surface side of the semiconductor substrate with respect to the anode region; and a first conductivity type cathode region disposed in an area exposed on the back surface of the semiconductor substrate; the IGBT region and the diode region are adjacent to each other in a plan view of the semiconductor substrate, in the plan view of the semiconductor substrate, a first boundary plane where the collector region and the cathode region are adjacent is shifted from a second boundary plane where the IGBT region and the diode region are adjacent on the front surface side of the semiconductor substrate either in a direction from the cathode region toward the collector region or in a direction from the collector region toward the cathode region. |
地址 |
Aichi JP |