| 摘要 |
PURPOSE:To shorten the inspection time of a pattern by placing a master reticle and a copy reticle on a stage by reversing the surface and the reverse side. CONSTITUTION:To a stage 1 of the title device, a master reticle 2 is set with its pattern surface up, and a copy reticle 3 is set with its pattern surface down. Subsequently, the reticle 2 and the reticle 3 are irradiated by a light beam from the lower part and the upper part, respectively by light sources 4, 7, respectively, and transmission light beams are received by detecting parts 5, 8 through lenses 6, 9. In this state, at the time of executing an inspection, the stage 1 is moved by information from a CPU 13, based on an initial value given from an operating part 14, pattern information from the detecting parts 5, 8 is compared by a comparing part 12, and a part which has been recognized as a defect is displayed on displays 10, 11. |
