| 摘要 |
<p>PURPOSE:To enhance the accuracy of the position of a phase shifter layer and the inspection of defects by forming the phase shifter layer of plural light transmittable films which vary in refractive index and providing a low reflectivity to an exposing wavelength and a high reflectivity to an inspecting wavelength. CONSTITUTION:Light shielding patterns 12 consisting of Cr, etc., are formed on a substrate 11 consisting of glass, etc., and the phase shifter layer 14 consisting of the plural light transmittable films which vary in the refractive index is formed in one of the aperture patterns 13. This layer 14 is formed of the three layers; the upper layer 14a consisting of, for example, CeF3, the intermediate layer 14b consisting of CeO2 and the lower layer 14c consisting of MgF2. A distinct light transmission pattern 15 of a pattern 13 is obtd. when this phase difference reticule is irradiated with exposing light of a prescribed wavelength. A pattern 13 of the point exclusive of the layer 14 is obtd. as a light transmission pattern 16 when the reticule is irradiated with transmission type detecting light of a prescribed wavelength.</p> |
