发明名称
摘要 <p>PURPOSE:To ensure perfect protection from static electricity as well as measurement and positioning. CONSTITUTION:A depression type MOS transistor is disposed between a short ring 11 and gate bus lines 6 as scanning lines and between the ring 11 and source bus lines 7 as signal lines. This transistor has a structure in which an insulating film and an n<+>-Si layer have been formed so as to cover a control gate bus line 12 laid between the lines 6 or 7 and the ring 11, one end of the Si layer has been connected to the lines 6 or 7 and the other end to the ring 11.</p>
申请公布号 JP2779085(B2) 申请公布日期 1998.07.23
申请号 JP19910347311 申请日期 1991.12.27
申请人 SHAAPU KK 发明人 HIRAKI JUNICHI;NISHIMURA YASUNORI;KAWAKAMI JUNZO
分类号 G02F1/136;G02F1/13;G02F1/1368;(IPC1-7):G02F1/136 主分类号 G02F1/136
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