发明名称 PHOTOMASK FOR FINE MACHINING
摘要 PURPOSE:To prevent the photomask from deforming, to improve the accuracy, and to repeating the same process scores of times by forming a reflecting film which reflects irradiation light sufficiently at a shield part. CONSTITUTION:For example, many small holes are formed as a mask pattern in a thin plate 4 of stainless steel, ceramic, etc., to form transmission parts where light is transmitted and shield parts 6 where the light is cut off. The reflecting films 7 which reflect light with target wavelength are formed at the shield parts 6 so as to prevent thermal variation due to light absorption. The reflecting films 7 are formed of, for example, Al vapor-deposited films or dielectric multi-layered films which reflect ultraviolet rays of, for example, 150 - 400nm with high reflectivity. Consequently, the deformation is eliminated regardless of irradiation with laser light, high accuracy of several mum and less is obtained, and the machining is repeated many times.
申请公布号 JPH04109246(A) 申请公布日期 1992.04.10
申请号 JP19900152374 申请日期 1990.06.11
申请人 HAMAMATSU PHOTONICS KK 发明人 TAKAOKA HIDEJI;FUKUMITSU KENJI
分类号 G03F1/52;G03F1/58 主分类号 G03F1/52
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