| 摘要 |
<p>PURPOSE: To prevent generation of high resistance even in a heating process for sealed attachment and perform a stable foaming process with a low voltage by furnishing a protrusive step consisting of an insulating material between element electrode on a base board in such a way as positioned apart from the electrodes. CONSTITUTION: A substrate 1 is sufficiently washed with a detergent, pure water, and organic solvent, and an insulating material and element electrode material are deposited by the vacuum evaporation, sputtering process, etc., and a protrusive step 6 and element electrodes 4, 5 are formed on the board 1 by means of photolithographic process. An organic metal solution containing as chief element the metal constituting a conductive thin film 3 is applied to the board 1, dried, heated as a baking process, and subjected to a lift-off and etching process, and thus the conductive film 3 with patterning is produced. Then a current is fed to between the element electrodes 4, 5 so that the film 3 is locally destroyed, deformed, or denatured, and an electron emission part 2 is accomplished.</p> |
