| 摘要 |
PROBLEM TO BE SOLVED: To reduce generation of slip of a wafer, suppress defective coloring of the wafer and prevent generation of particles within a furnace. SOLUTION: A wafer boat 1 is a so-called vertical wafer boat in which four pole support members 2 are arranged in parallel with each other by a pair of upper plate 3 and lower plate 4. Each support member 2 is provided with a plurality of slits 2a with the predetermined interval in order to load semiconductor wafers. Material at least to form the support member 2 is glass carbon material and this glass carbon material has the porous coefficient ratio of 0.2% or less and the surface roughness of the support member 2 is set to 0.5 to 1.5μm. |
