| 摘要 |
PURPOSE: A method for manufacturing a field emitter display device is provided to improve characteristics of a field emission display device by forming an emitter tip using a diamond. CONSTITUTION: A pixel protective layer is formed on one side of a silicon substrate. A diamond crystal is grown on the other side of the silicon substrate. The diamond crystal of a predetermined size remains by etching the diamond crystal. The silicon substrate is etched by using the diamond crystal and the pixel protective layer as a mask. An insulating layer(17) and a metal thin film(19) are formed on a whole structure. A photoresist layer is applied on the metal thin film(19). The diamond crystal, the insulating layer(17), and the metal thin film(19) are exposed by etching the photoresist layer. The insulating layer(17) and the metal thin film(19) are etched. The photoresist layer is removed.
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