| 摘要 |
PURPOSE: A device for preventing the dewfall of an adhesion accelerator of a coater is provided to minimize the defective coating of a photoresist by preventing the dewfall of an adhesion promoting agent in an adhesion unit of a coater. CONSTITUTION: An adhesion promoting agent coating system comprises an HMDS(Hexamethyldisilazane) tank(1) having a bubble plate(5), an HMDS dispenser(6) for dispensing the HMDS gas generated from the HMDS tank to the upper face of a wafer, an HMDS supply line(3) for connecting the HMDS tank with the HMDS dispenser, an HMDS dispensing valve(14) installed on the HMDS supply line, and a hot plate(7) loaded with the wafer and installed below the HMDS dispenser. An air suction line(10) is installed on the HMDS supply line to suck the air on the HMDS supply line. A vacuum line(12) is installed on the HMDS supply line to discharge the air sucked by the air suction line. Three-way valves(9,11) are installed at the connecting portions of the HMDS supply line, the air suction line, and the vacuum line.
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