PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING IT, AND PRODUCTION OF PHOSPHOR PATTERN, PHOSPHOR PATTERN USING IT, AND BACK PLATE FOR PLASMA DISPLAY PANEL

摘要

PROBLEM TO BE SOLVED: To form a phosphor pattern in a uniform shape with high accuracy and good workability in which edge fusion (oozing in the edge part) is suppressed, by incorporating a polymer binder having ethylenic unsatd. groups, a photopolymn. initiator which produces free radicals by irradiation of active rays, and a phosphor. SOLUTION: This resin compsn. contains (a) a polymer binder having ethylenic unsatd. groups, (b) a photopolymn. initiator which produces free radicals by irradiation of active rays, and (c) a phosphor. The phosphor pattern is produced in the following processes. First, the photosensitive element is applied by heating and pressurizing on a plasma display panel substrate 1 having barrier ribs 2 as a substrate having recesses and protrusions in such a manner that the photosensitive resin compsn. layer 5 containing the phosphor is in contact with the ribs. Then the upper part of a thermoplastic resin layer 4 is irradiated with active rays 8 through a photomask 7 to form an image. After removing the supporting film on the thermoplastic resin layer 4, the resin layer is developed and further baked to remove unnecessary part. Thus, the phosphor pattern is formed.