| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-treating device capable of supplying dried gas to a substrate while keeping a liquid level in a treatment liquid at constant height when pulling up the substrate from the treatment liquid. SOLUTION: The substrate-treating device has: a treatment tank 1 storing the treatment liquid; a lifter mechanism 3 raising and lowering the substrate W between a treatment position in the treatment tank 1 and an upper position in the treatment tank 1 while holding the substrate W; an air supply section 5 for supplying dried air in a direction along the upper end face of the treatment tank 1; and a jet pipe 11 supplying the treatment liquid to the treatment tank 1. When the substrate W is raised to the upper position from the treatment one, a control section supplies dry gas from the air supply section 5, supplies demineralized water from the jet pipe 11, and keeps the liquid level in the treatment liquid constant at the height of the upper end of the treatment tank 1, thus keeping a position, where the substrate W starts to be exposed from the treatment liquid, at the same height, and hence uniformizing a dry state over the entire surface of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
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