发明名称 METHODS AND APPARATUS FOR WET CLEANING ELECTRODE ASSEMBLIES FOR PLASMA PROCESSING APPARATUSES
摘要 Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing plates and electrode assemblies can be new, used or refurbished. A flushing fixture that can be used in the cleaning methods is also provided. ® KIPO & WIPO 2009
申请公布号 KR20090090309(A) 申请公布日期 2009.08.25
申请号 KR20097009911 申请日期 2007.10.10
申请人 LAM RESEARCH CORPORATION 发明人 SHIH HONG;YIN YAOBO;AUGUSTINO JASON;ZHOU CATHERINE;AVOYAN ARMEN
分类号 H01L21/302;H01L21/205;H01L21/3065 主分类号 H01L21/302
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