发明名称 MOTION ANALYSIS DEVICE, MOTION ANALYSIS SYSTEM, MOTION ANALYSIS METHOD, PROGRAM, AND RECORDING MEDIUM
摘要 A motion analysis device includes: a first specifying unit that specifies a first axis which lies in a longitudinal direction of a shaft of an exercise tool at an address posture of a user, using an output of an inertial sensor; a second specifying unit that specifies a second axis forming a predetermined angle along with the first axis, using a hitting direction as a rotation axis; and an adjustment unit that adjusts sizes of an angle of the first axis and an angle of the second axis relative to a plane according to a predetermined condition.
申请公布号 US2016175674(A1) 申请公布日期 2016.06.23
申请号 US201514965278 申请日期 2015.12.10
申请人 SEIKO EPSON CORPORATION 发明人 HAYAISHI Ikuo
分类号 A63B60/46;A63B71/06;A63B24/00 主分类号 A63B60/46
代理机构 代理人
主权项 1. A motion analysis device comprising: a first specifying unit that specifies a first axis which lies in a longitudinal direction of a shaft of an exercise tool at an address posture of a user, using an output of an inertial sensor; a second specifying unit that specifies a second axis forming a predetermined angle along with the first axis, using a hitting direction as a rotation axis; and an adjustment unit that adjusts sizes of an angle of the first axis and an angle of the second axis relative to a plane according to a predetermined condition.
地址 Tokyo JP