| 摘要 |
A substrate processing system for processing an essentially vertically- oriented substrate, comprising:
a first deposition chamber (101) having a first processing region and being adapted to deposit a first layer comprising a first material;
a second deposition chamber (102) having a second processing region and being adapted to deposit a second layer over the first layer, the second layer comprising a second material;
a third deposition chamber (103) having a third processing region and being adapted to deposit a layer comprising the second material;
a transfer chamber (111) providing essentially linear transport paths with the first, the second, and the third deposition chambers, respectively; and
a further chamber (121) comprising a first and a second transportation track (163,164), wherein at least one of the first and second transportation tracks forms an essentially linear transportation path with the first processing chamber,
wherein the first deposition chamber (101) is adapted to receive the substrate from the transfer chamber, and to deposit a further layer comprising the first material. |
