发明名称 |
Overlay error determination mark considering influence of aberration |
摘要 |
An aberration estimation reticle is provided with a plurality of units spaced from each other. The unit is provided with a first determination mark having a square planar configuration, and a second determination mark located in the first determination mark and including a plurality of holes arranged along a square. These structures provide an overlay error determination reticle and a method of determining an overlay error with the reticle taking an influence by aberration into consideration.
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申请公布号 |
US6165656(A) |
申请公布日期 |
2000.12.26 |
申请号 |
US19990293783 |
申请日期 |
1999.04.20 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TOMIMATU, YOSHIKATU |
分类号 |
G03F1/08;G03F1/14;G03F7/20;H01L21/027;H01L21/66;(IPC1-7):G03F9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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