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发明名称
SUBSTRATE PROCESSING CHAMBER, A METHOD OF FORMING A PLASMA IN A SUBSTRATE PROCESSING CHAMBER AND SUBSTRATE PROCESSING SYSTEM
摘要
申请公布号
KR100801346(B1)
申请公布日期
2008.02.05
申请号
KR20010028908
申请日期
2001.05.25
申请人
发明人
分类号
H05H1/00;H05H1/46;B01J19/08;C23C16/505;C23F4/00;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;(IPC1-7):H05H1/00
主分类号
H05H1/00
代理机构
代理人
主权项
地址
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