发明名称 |
EMBOSSING WITH PRINTED RELIEF PATTERN |
摘要 |
An embossing apparatus includes an embossing die that includes a printed relief pattern made up of multiple layers of a deposited material. A resilient surface presses media against the embossing die such that embossed features corresponding to the embossing die are formed in the media. A method for embossing media includes forming an embossing die by depositing multiple layers of ink on a impression layer to form a relief pattern and pressing media against the embossing die to transfer the relief image to the media. |
申请公布号 |
US2016200093(A1) |
申请公布日期 |
2016.07.14 |
申请号 |
US201615076600 |
申请日期 |
2016.03.21 |
申请人 |
HEWLETT-PACKARD INDIGO B.V. |
发明人 |
Sandler Mark;Lior Shai;Peleg Eyal;Sinuany Nati;Kella Dror;Stein Shahar;Trendafilov George;Rosenbaom Tsahi |
分类号 |
B41F19/06 |
主分类号 |
B41F19/06 |
代理机构 |
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代理人 |
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主权项 |
1. An embossing apparatus comprising:
an embossing die to receive a printed relief pattern made up of multiple layers of a deposited material; a resilient surface to deposit an ink image onto a media, the resilient surface for pressing the media against the embossing die such that embossed features corresponding to the printed relief pattern on the embossing die are formed in the media; and an alignment component in a printer for receiving a printed alignment image, the embossing die to be aligned with the alignment image on the alignment component of the printer. |
地址 |
Amstelveen NL |