EVALUATION METHOD FOR CHARGED PARTICLE BEAM LITHOGRAPHY APPARATUS

摘要

PROBLEM TO BE SOLVED: To acquire an appropriate settling time by improving evaluation accuracy of a deflection displacement amount depending on the settling time of a charged particle beam lithography apparatus.SOLUTION: The charged particle beam lithography apparatus uses a deflector that is disposed on an optical path of a charged particle beam, to move an irradiation position of the charged particle beam. An evaluation method for the lithography apparatus includes the steps of: taking a shot of a first pattern; taking a shot of a second pattern by moving the irradiation position from the first pattern in a first direction; taking a shot of a third pattern by moving the irradiation position from the second pattern in the first direction; taking a shot of a fourth pattern between the second pattern and the third pattern by moving the irradiation position from the third pattern in a second direction that is opposite to the first direction; measuring positions of the second pattern and the fourth pattern and calculating an interval between the second pattern and the fourth pattern; and comparing the interval with a reference interval.SELECTED DRAWING: Figure 3