发明名称 GAS MASKING METHOD
摘要 PURPOSE:To easily detect the leak quantity and leak place of a vacuum con tainer with high accuracy, by spraying gas having large mol.wt. to the periphery of a flaw part from the outer periphery of a nozzle pipe to form a gas film and spraying helium gas to the flaw part from the center of a pipe. CONSTITUTION:The interior 2 of a vacuum container 1 is evacuated by an exhaust apparatus 9 and the nitrogen gas from the passage 5A of a probe 4 is sprayed to the connection part 3 of the container 1 to form a gas layer 5B which is, in turn, sucked to be recovered from an exhaust port 7. After several sec is elapsed from this state, helium gas 6A is sprayed to the connection part 3 to form a gas layer 6B. The gas layer 6B is recovered from the exhaust port 7 but the quantity of the helium gas leaked to the interior 2 of the container 1 from the connection part 3 is measured by a detector 10. Therefore, even when an article to be detected is large or has a complicated shape, the leak quantity and leak place of the container can be easily detected with high accuracy.
申请公布号 JPS63106533(A) 申请公布日期 1988.05.11
申请号 JP19860249686 申请日期 1986.10.22
申请人 HITACHI LTD 发明人 SEKIYAMA HIROMI;OWADA KORO;MORITA TAKAMASA;MOTAI KAZUO
分类号 G01M3/20 主分类号 G01M3/20
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