发明名称 |
SYSTEM AND METHOD FOR PNEUMATIC DIAPHRAGM CMP HEAD HAVING SEPARATE RETAINING RING AND MULTI-REGION WAFER PRESSURE CONTROL |
摘要 |
An apparatus and method for planarizing a substrate are provided. The apparatus (101) includes a carrier (106) having: a plate (261) for receiving the substrate (230) thereon; a first chamber (297) for forcing the plate in a predetermined direction; a spacer (260) coupled to an outer edge (282) of the plate; a membrane (250) coupled to the plate via the spacer and separated from the plate by a thickness of the spacer; and a second chamber (298) defined between the membrane and the plate for forcing the membrane in another predetermined direction. The method involves pressing a peripheral edge of the substrate (113) against a polishing pad (135) with a first pressure, and pressing an interior of the substrate against the pad with a second pressure. The first pressure may be provided through a mechanical contact with the peripheral edge of the substrate (113), a pneumatic pressure exerted through a membrane (250), or by gas pressing directly against a portion of the substrate. |
申请公布号 |
WO0187541(A2) |
申请公布日期 |
2001.11.22 |
申请号 |
WO2001US15306 |
申请日期 |
2001.05.11 |
申请人 |
MULTI-PLANAR TECHNOLOGIES, INC. |
发明人 |
KAJIWARA, JIRO;MOLONEY, GERARD, S.;WANG, HUEY-MING;HANSEN, DAVID, A.;REYES, ALEJANDRO |
分类号 |
B24B37/30;B24B37/32;B24B49/16;H01L21/304 |
主分类号 |
B24B37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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