发明名称 INTERFEROMETRIC APPARATUS AND METHOD
摘要 <p>Interferometric apparatus (26) for measuring changes in altitude between a surface (30) and a datum line where the apparatus comprises a dimensionally stable metrology frame (11) and the datum line is defined in an object (12) mounted for nominally plane translation with respect to the metrology frame in at least two orthogonal directions while experiencing relatively smaller changes in altitude in a direction nominally normal to said at least two orthogonal directions. Elongated reflector means are mounted with respect to either the metrology frame or the object to provide the surface, and at least one interferometer system (28) is mounted at least in part on said object for movement therewith. The interferometer system is structured to provide a measurement beam (32) that travels along at least one optical path to and from the elongated reflector means to provide a signal containing information that varies in accordance with changes in altitude between the surface and the datum line as the object moves, and is configured so that the signal is insensitive to variations in angular rotation of the object at least about one of the two orthogonal directions.</p>
申请公布号 WO2001088469(A1) 申请公布日期 2001.11.22
申请号 US2001040702 申请日期 2001.05.09
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