MAGNETRON SPUTTERING DEVICE

摘要

A magnetron sputtering device capable of forming a magnetic thin film by using as a target a magnetic element having a thickness suitable for mass-production, and being good in production efficiency, low in cost and excellent in economies, the device comprising the device's target consisting of a magnetic element, and a magnetic field generating means consisting of a rare-earth magnet and provided behind a target, a space being formed so as to surround a target on the substrate side. An auxiliary magnetic field generating means is provided on the periphery edge outer side with its magnetic pole surface facing the center of the space so as to form an unbalanced magnetic field in the space by the rare-earth magnet and the auxiliary magnetic field generating means.