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发明名称
Verfahren und Vorrichtung zur Lieferung eines Gases an eine Epitaxie-Züchtung
摘要
申请公布号
DE69804422(T2)
申请公布日期
2002.07.18
申请号
DE19986004422T
申请日期
1998.06.15
申请人
MITSUBISHI MATERIALS SILICON CORP., TOKIO/TOKYO;MITSUBISHI MATERIALS POLYCRYSTALLINE SILICON CORP., YOKKAICHI
发明人
TOYAMA, YOSHIHARU;KURODA, AKIKAZU;KIYAMA, TOKUJI;KIDA, SUMIO;YOSHIDA, SHUNJI;YAMAMOTO, TAKASHI;ATSUMI, TETSUYA
分类号
B01F3/02;B01F13/10;C23C16/455;C30B25/02;C30B25/14;(IPC1-7):C30B25/14;C23C16/44;C30B29/06
主分类号
B01F3/02
代理机构
代理人
主权项
地址
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