发明名称 ALL-GASEOUS DEPOSITION OF NANOCOMPOSITE FILMS
摘要 An ion cluster gaseous deposition technique and a polymer matrix gaseous deposition technique are combined to form nanocomposite films which exhibit characteristics useful, for example, for photovoltaic and sensor protection devices. A three-dimensional array of intact ion clusters comprising quantum dots are embedded in a conducting polymer matrix. The ion clusters and the polymer matrix are formed using their own respective gaseous deposition techniques. Varying each gaseous deposition technique, or simultaneously varying both gaseous deposition techniques alters the characteristics of the resulting nanocomposite film. The nanocomposite films are produced in a vacuum environment in a manner that reduces health risks. Also disclosed are photovoltaic and optical devices produced using the gaseous deposition technique.
申请公布号 WO2008108809(A2) 申请公布日期 2008.09.12
申请号 WO2007US19894 申请日期 2007.09.12
申请人 THE BOARD OF TRUSTEES OF THE UNIVERSITY OF ILLINOIS;HANLEY, LUKE;BOLOTIN, IGOR, L.;ASUNSKIS, DANIEL, J.;WROBLE, AMANDA, T.;ZACHARY, ADAM, M. 发明人 HANLEY, LUKE;BOLOTIN, IGOR, L.;ASUNSKIS, DANIEL, J.;WROBLE, AMANDA, T.;ZACHARY, ADAM, M.
分类号 C23C14/06;C23C14/32 主分类号 C23C14/06
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