发明名称 |
METHOD FOR PRODUCING LAYERED STRUCTURES ON A SUBSTRATE, SUBSTRATE AND SEMICONDUCTOR COMPONENTS PRODUCED ACCORDING TO SAID METHOD |
摘要 |
The invention relates to a method for producing layered structures, whereby a preferably porous material layer with hollow cavities is produced on or from a monocrystalline p-type or n-type Si substrate. The layered structure or a part thereof is applied to said layer and subsequently, the layered structure or a part thereof is separated from the substrate using said layer as a desired break-off point, e.g. by producing mechanical tension inside said layer or on a boundary surface of said layer. The method is characterized in that the surface of the substrate is structured before the porous layer is produced or that the surface of the porous layer is structured. |
申请公布号 |
WO9901893(A2) |
申请公布日期 |
1999.01.14 |
申请号 |
WO1998EP03992 |
申请日期 |
1998.06.30 |
申请人 |
MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V.;BRENDEL, ROLF |
发明人 |
BRENDEL, ROLF |
分类号 |
B01J19/08;C30B29/06;C30B29/66;H01L21/20;H01L21/304;H01L21/306;H01L21/762;H01L31/0236;H01L31/04;H01L31/052;H01L31/068;H01L31/18 |
主分类号 |
B01J19/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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