| 摘要 |
PURPOSE:To simplify a manufacturing process, to prevent the generation of a defective picture, to select a material for an insulating substance easily and to obtain a picture having high quality by leaving one part of a section between picture elements without etching and connecting a transparent electrode when an isolation groove for obviating a crosstalk is formed to the section between the picture elements. CONSTITUTION:A photoconductive layer 2 and a transparent electrode 5 consisting of ITO, etc. are sputtered and evaporated onto a scanning circuit substrate 1, a residual region M section is not removed and left, and the transparent electrode 5 through a wet etching method and the photoconductive layer 2 through a dry etching method, etc. are etched and eliminated. There are the residual regions M at every picture element P, and there are the regions M only in grooves G running in the lateral direction. Such grooves are shaped, and the insides of the isolation grooves are filled with insulator layers 6. Optical shielding layers 10 for preventing the crosstalks of beams are formed on the grooves in sections among picture elements. The ratio of the width Y of the residual regions M to picture-element width X may be kept within a range of Y/X=approximately 7/8-1/2. |
