| 摘要 |
PURPOSE:To facilitate alignment with high accuracy even in the case of the exposure of a large picture such as a liquid crystal display panel by a method wherein the positions of the alignment marks of masks are changed for the respective shots so as to prevent the alignment marks of one original from coming to the boundary positions of the other originals. CONSTITUTION:When the exposure of 1st shot is performed, at first a mask 1a is aligned with mask reference marks on an apparatus side. After that, the mask 1a and a substrate 3 are aligned by using the alignment marks of the mask 1a and the alignment marks of the substrate 3 formed in a previous process and the exposure of the 1st shot is performed. Also, when the exposure of 2nd shot and thereafter are performed. After marks 1b-1d are set on the apparatus main part and aligned as in the 1st shot, the exposures are carried out. The masks 1a-1d with four different patterns are successively transferred to the direction of arrows (l) and the substrate 3, which is an object to be exposed, is shifted by an X-Y stepping stage 4 so as to make four divided sections to be exposed successively. After the alignment is finished, the masks 1a-1d and the substrate 3 are scanned by a fixed mirror projection system 5 as one body and the patterns on the masks are transcripted onto the substrate 3. |
