| 摘要 |
<p>PURPOSE:To obviate light leakage and to lessen the generation of a counter shorting by superposing the respective end parts of black patterns and picture element patterns. CONSTITUTION:A black resist is applied to about 1mum thickness on a transpar ent substrate 1 and is prebaked at 100 deg.C to form a black resist film 8. Polyvinyl alcohol is applied by a spinner on this film 8 and is prebaked at 100 deg.C to form an oxygen barrier film 9. A photomask 10 is installed on the coated surface by leaving 20mum spacing therefrom and is exposed; thereafter, the substrate is heated to 100 deg.C and is then developed by immersing the same in an aq. soln. of 1wt.% sodium carbonate and is rinsed. This substrate is heated at 200 deg.C to form the black patterns 11. The red resist is applied to 1mum thickness thereon and is prbaked to form a red resist film 12 and the oxygen barrier film 9. A photomask 13 for red color is applied on the surface and the resist is exposed and developed to form the red patterns 14. Further, the green and blue patterns 15, 16 are formed by using the green and blue resists by the procedures similar to the procedures for forming the red pattern 14. The color filter which is free from the light leakage is obtd. in this way.</p> |
