发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To obtain a positive type resist compsn. having superior sensitivity, resolution, heat resistance, shelf stability and a high remaining rate of a film by incorporating quinonediazidosulfonic ester of a vinylphenol compd. and/or an isopropenylphenol compd. as a sensitizer. CONSTITUTION:When a resist compsn. contg. alkali-soluble phenol resin and a sensitizer is produced, ester of a vinylphenol compd. and/or an isopropenylphenol compd. such as vinylphenol, isopropenylphenol, ring-substd. products of the phenols, oligomers or hydrogenated products with a quinonediazidosulfonic acid compd. is used as the sensitizer. This sensitizer can be synthesized by esterifying the vinylphenol compd. and/or the isopropenylphenol compd. with the quinonediazidosulfonic acid compd. A positive type resist compsn. having superior sensitivity, resolution, heat resistance, shelf stability and a high remaining rate of a film can be obtd.
申请公布号 JPH03119358(A) 申请公布日期 1991.05.21
申请号 JP19890257271 申请日期 1989.10.02
申请人 NIPPON ZEON CO LTD 发明人 OIE MASAYUKI;KAWADA MASAJI;YAMADA TAKAMASA
分类号 G03F7/023;G03F7/022;H01L21/027;H01L21/30 主分类号 G03F7/023
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