| 摘要 |
PURPOSE: To obtain a black matrix pattern in which resist residues of protruding shape are not generated at corner parts of the pattern at the time of forming a black matrix of a color filter for a liquid crystal display device of a resin by providing a chamfer at a top end part of a corner of the pattern of a photomask for forming a pattern. CONSTITUTION: Chamfers 4 are previously provided at the top end parts of the corners of the patterns of the photomask 1 for forming a pattern in a forming process of the black matrix made of resin of the color filter for the liquid crystal display device on a transparent substrate. Consequently, corner parts of the pattern of the black matrix 2 are smooth and projections 3 are not generated. As to a chamfering quantity, the angle of the chamfer 4 is preferably 45 deg. and a distance between a corner apex of a pattern without forming a chamfer and both ends of a chamfering side is preferably 2 to 10μm for preventing a projection and maintaining numerical aperture. Shape of the chamfer 4 may be linear or circular arc. |
