SPUTTERING TARGET MATERIAL AND ITS PRODUCTION

摘要

PROBLEM TO BE SOLVED: To produce an A1 or A1 alloy sputtering target material that the generation of splashes is hard to occur when sputtering and to provide a method for producing it. SOLUTION: Relating to an A1 or A1 alloy sputtering target material that the maximum length of all inclusions existing therein is regulated to <=20μm and a method for producing an A1 or A1 alloy sputtering target material by a spray foaming method, the value of the outflow (Nm<3> ) of gas/the outflow (kg) of molten metal in a gas atomizing stage in the spray foaming method is regulated to >=5 Nm<3> /kg.