| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device for cleaning a substrate, wherein both front and rear surfaces of a substrate to be cleaned are washed precisely at the same time without damages, providing effect and efficiency in cleaning almost equalling. badge type cleaning. SOLUTION: A substrate-cleaning device 1 comprises a holding body 330 for holding horizontally a substrate S which is to be cleaned, a rotating/driving device 3 for rotating the holding body 330 which holds the substrate S, a cleaning bath 4 for housing a minimum required cleaning liquid, and a high-frequency vibration generating device 5 which, fitted to the side surface of the cleaning bath 4, emits a high-frequency vibration toward a peripheral edge Sc of the substrate S. Here, both front and rear surfaces Sa and Sb of the substrate S are cleaned through ultrasonic waves with high-frequency vibration emitted from the high-frequency vibration generating device 5 through the cleaning liquid.
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