发明名称 MANUFACTURING METHOD OF PLATINUM LOWER ELECTRODE AND FERROELECTRIC CAPACITOR, AND FERROELECTRIC CAPACITOR
摘要 PROBLEM TO BE SOLVED: To provide a ferroelectric capacitor, whose resistance to fatigue is improved, when compared to a ferroelectric capacitor which is manufactured by employing a low-temperature deposition technique for a platinum lower electrode of a conventional technique, and reduce stress and raise its thermal stability as the whole of a ferroelectric capacitor stack, when compared to a ferroelectric capacitor stack of the conventional technique. SOLUTION: This manufacturing method of a lower electrode, which is suitable for use in a ferroelectric capacitor on a substrate comprises a process for forming an adhesion layer on the substrate and a process for forming a platinum thin-film layer deposited on the adhesion layer at 300 to 800 deg.C.
申请公布号 JP2001313376(A) 申请公布日期 2001.11.09
申请号 JP20010125655 申请日期 2001.04.24
申请人 RAMTRON CORP;ULVAC JAPAN LTD 发明人 GLENN R FOX;HINA KOUKO
分类号 H01L27/105;C23C14/18;H01L21/02;H01L21/8246;(IPC1-7):H01L27/105 主分类号 H01L27/105
代理机构 代理人
主权项
地址