METHOD FOR FORMING COLOR OF SEM IMAGE OF SEMICONDUCTOR MEASURING EQUIPMENT TO EASILY MONITOR DEFECTIVE STATE

摘要

PURPOSE: A method for forming the color of a SEM(scanning electron microscope) image of semiconductor measuring equipment is provided to easily monitor a defective state by making the SEM image of a wafer be seen in color when a beam is injected to semiconductor measuring equipment to take a SEM picture of the wafer. CONSTITUTION: The first electron ray generated from an electron gun(10) is formed of an optimized beam state through the first column(30) to be irradiated to a sample(24). The second electron ray on which the first electron ray irradiated to the sample is reflected is formed of an optimized beam state through the second column(26). The optimized second electron ray is multi-level amplified. The amplified electron ray of each level is converted to form a SEM image of various colors.