| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new fluorine-containing cyclic compound and a fluorine-containing polymer compound and to provide a resist material having high transparency in broad wavelength area from an ultraviolet light area to a near-infrared light area and having high adhesiveness and film-forming property to substrates and high etching resistance together and to provide a pattern-forming method using the resist material and to provide a package material for semiconductor devices. <P>SOLUTION: The fluorine-containing cyclic compound is represented by general formula (1) [wherein R1a is a 1-25C cyclic alkyl group, a cyclic alkenyl group or a cyclic alkynyl group; R2 and R3 are each a hydrogen atom, a halogen atom, a 1-25C straight-chain or branched or cyclic alkyl group and R1a, R2 and R3 may be each an atomic group containing a fluorine atom, an oxygen atom, a sulfur atom, a nitrogen atom or a carbon-carbon double bond]. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
