| 摘要 |
<p>The present invention relates to a heater for heating a material to be heated. The inventive partition-type heating apparatus has advantageous effects in that a to-be-heated material, i.e., a reaction gas used in a chemical vapor deposition (CVD) process is pre-heated and the pre-heated reaction gas flows through a flow channel defined by the vertical and horizontal partitions so that the flowing reaction gas is heated by the transfer of heat generated from a hot wire during the flow of the reaction gas, thereby securing heating performance required for a small-sized heating apparatus.</p> |
