发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
An immersion lithographic projection apparatus is disclosed in which a shutter member is employed to block a liquid supply system during substrate swap to ensure that liquid remains in contact with anl element of the projection system during substrate swap. The shutter member is connected to a metrology frame which also supports the projection system. In this way the position of the shutter member is always known.
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申请公布号 |
US2007216882(A1) |
申请公布日期 |
2007.09.20 |
申请号 |
US20060378627 |
申请日期 |
2006.03.20 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BENSCHOP JOZEF P.H.;BUTLER HANS;KEMPER NICOLAAS R.;KOEK BARTHOLOMEUS H.;VAN DER MEULEN FRITS;VAN DER SCHOOT HARMEN K. |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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