| 摘要 |
Photomasks that are used to form a fine contact hole array, a method of fabricating the photomask, and use of the photomask. The photomask includes a transparent substrate; a plurality of line-type opaque patterns being formed on the transparent substrate, for defining floodlighting portions for forming patterns; and phase-shifting regions being arranged on the transparent substrate between the opaque patterns at predetermined intervals, the phase-shifting regions defining floodlighting portions for contact holes. A fine and dense contact hole array can be easily formed using the photomask together with a customized illumination. Therefore, a fine contact hole of a good quality can be formed directly on a photoresist using the photomask without additional processes.
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