发明名称 |
DETECTING METHOD OF PHASE ERROR FOR PHASE SHIFT MASK |
摘要 |
A method for detecting the phase error of a phase shift mask simply and with ease is disclosed and comprises the steps of: arranging a plurality of phase shift patterns, each having a predetermined width and serving to shift the light transmitted through predetermined regions of a transparent substrate of the phase shift mask, at a regular space on the transparent substrate; arranging a pattern for detecting phase error in which a light screen with a predetermined width is located between the predetermined regions of the transparent substrate and the phase shift mask; patterning a wafer by use of the phase shift mask and the patterns for detecting phase error; comparing the sizes by defocuses of the patterns in which phase is shifted with those of the patterns in which phase is not shifted; and utilizing the difference in the pattern size to detect the phase error. |
申请公布号 |
KR0172789(B1) |
申请公布日期 |
1999.03.20 |
申请号 |
KR19950033878 |
申请日期 |
1995.10.04 |
申请人 |
HYUNDAI ELECTRONICS IND. CO.,LTD |
发明人 |
AHN, CHANG-NAM;KIM, HONG-ILL |
分类号 |
G03F1/34;G03F1/68;G03F1/84;H01L21/027 |
主分类号 |
G03F1/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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