Gas barrier thin film, electronic device comprising the same, and method of preparing the gas barrier thin film

摘要

A gas barrier thin film having a substrate, an anchoring layer, and an inorganic oxide layer, the anchoring layer including a silicon-containing organic-inorganic composite copolymer comprising a repeating unit of the formula
—(SiO)n—,
a repeating unit of the formula
—(SiR1R2—NR3)m—,
and at least one or a combination of repeating units of the formulas
;
wherein at least one of R1, R2, and R3 is independently hydrogen, R1, R2, and R3 are each independently C1-C5 alkyl, C2-C5 alkenyl, C2-C5 alkynyl, C1-C5 alkoxyl, or C6-C15 aryl, R4, R5, R6, and R7 are each independently hydrogen, C1-C3 alkyl, C1-C3 alkoxyl, C3-C10 cycloalkyl, or C6-C15 aryl, R4 and R5 are not simultaneously hydrogen, R6 and R7 are not simultaneously hydrogen, n+m+r=1, 0

主权项

1. A gas barrier film comprising:
a substrate; an anchoring layer disposed on a surface of the substrate; and an inorganic oxide layer disposed directly on a surface of the anchoring layer opposite the substrate, wherein the inorganic oxide layer comprises Al2O3, MgO, ZnO, or a mixture thereof; wherein the anchoring layer comprises a coating of a silicon-containing organic-inorganic composite copolymer as a thermoset of a mixture of a polysilazane and a polysiloxane-based polymer, wherein the copolymer comprises a repeating unit represented by Formula 1 below; a repeating unit represented by Formula 2 below; and at least one repeating unit selected from the group consisting of repeating units represented by Formulas 3 and 4 below, and a combination thereof:
—(SiO)n—  Formula 1—(SiR1R2—NR3)m—  Formula 2wherein at least one of the group consisting of R1, R2, and R3 is independently hydrogen, and the remaining R1, R2, and R3 are each independently a C1-C5 alkyl group, a C2-C5 alkenyl group, a C2-C5 alkynyl group, a C1-C5 alkoxyl group, or a C6-C15 aryl group,
R4, R5, R6, and R7 are each independently hydrogen, a C1-C3 alkyl group, a C1-C3 alkoxyl group, a C3-C10 cycloalkyl group or a C6-C15 aryl group, R4 and R5 are not simultaneously hydrogen, R6 and R7 are not simultaneously hydrogen, n+m+r=1, 0