发明名称 |
Methods of fabricating polycrystalline diamond compacts |
摘要 |
Embodiments of the invention relate to methods of fabricating a polycrystalline diamond compacts and applications for such polycrystalline diamond compacts. In an embodiment, a method of fabricating a polycrystalline diamond compact includes at least saturating a sintering aid material with non-diamond carbon to form a carbon-saturated sintering aid material and sintering a plurality of diamond particles in the presence of the carbon-saturated sintering aid particles to form a polycrystalline diamond table. |
申请公布号 |
US9381620(B1) |
申请公布日期 |
2016.07.05 |
申请号 |
US201414297359 |
申请日期 |
2014.06.05 |
申请人 |
US SYNTHETIC CORPORATION |
发明人 |
Miess David P.;Vail Michael A.;McMurray C. Eugene |
分类号 |
B24D3/00;B24D3/02;B24D11/00;B24D18/00;C09K3/14;E21B10/567 |
主分类号 |
B24D3/00 |
代理机构 |
Dorsey & Whitney LLP |
代理人 |
Dorsey & Whitney LLP |
主权项 |
1. A method of fabricating a polycrystalline diamond compact, comprising:
providing an at least partially leached polycrystalline diamond body including a plurality of bonded diamond grains exhibiting diamond-to-diamond bonding therebetween and defining a plurality of interstitial regions; forming an assembly including the at least partially leached polycrystalline diamond body, a substrate, and an at least carbon-saturated infiltrant layer positioned between the at least partially leached polycrystalline diamond body, the at least carbon-saturated infiltrant layer including at least carbon-saturated material at least saturated with non-diamond carbon; and subjecting the assembly to a high-pressure/high-temperature process effective to infiltrate at least a portion of the plurality of interstitial regions of the at least partially leached polycrystalline diamond body with at least a portion of the at least carbon-saturated material from the at least carbon-saturated infiltrant layer. |
地址 |
Orem UT US |