| 摘要 |
The present invention provides an apparatus for processing a substrate with liquid. A liquid storing member includes: a tank having a receiving space capable of receiving a treatment liquid; and a measuring unit for measuring a level of the treatment liquid received in the receiving space. The measuring unit includes: a measuring member positioned in the receiving space to be floated in the treatment liquid received in the receiving space; and a controller electrically connected to the measuring member. The measuring member differentially transfers a current value by the level of the treatment liquid to the controller. Therefore, the level of the treatment liquid can be more accurately measured. |
