发明名称 VERTICAL WAFER BOAT
摘要 PROBLEM TO BE SOLVED: To provide a vertical wafer boat where the strut has a rectangular profile, and which is capable of forming a more uniform film, by making the deposition gas flow more uniform between the wafer supports, and suppressing the film thickness variation in the wafer surface.SOLUTION: In a vertical wafer boat 1 constituted of a strut 4 where a wafer support 4a for mounting a plurality of wafers is formed, and a top plate 5 and a bottom plate 6 for fixing the upper and lower parts of the strut 4, at least one strut 4 includes two strut parts 4b, 4c of rectangular profile, and a plurality of wafer supports 4a for connecting the two strut parts 4b, 4c, and mounting a wafer on the upper surface thereof.SELECTED DRAWING: Figure 6
申请公布号 JP2016149382(A) 申请公布日期 2016.08.18
申请号 JP20150023744 申请日期 2015.02.10
申请人 COORSTEK KK 发明人 KUROI SHIGEAKI;KIMURA TOMOKAZU;RI KENKI
分类号 H01L21/683;H01L21/205;H01L21/22 主分类号 H01L21/683
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