Electron beam plasma source with segmented suppression electrode for uniform plasma generation

摘要

A plasma reactor that generates plasma in a workpiece processing chamber by an electron beam, has an electron beam source and segmented suppression electrode with individually biased segments to control electron beam density distribution.

主权项

1. A plasma reactor for processing a workpiece, comprising:
a workpiece processing chamber; an electron beam source chamber comprising an electron beam source enclosure having a beam opening communicating with said workpiece processing chamber; an extraction electrode between said beam opening and said workpiece processing chamber and an acceleration electrode between said extraction electrode and said workpiece processing chamber and insulated from said extraction electrode; a suppression electrode between said extraction electrode and said acceleration electrode, said suppression electrode comprising plural segments insulated from one another, and respective bias sources coupled to respective ones of said plural segments, wherein said respective bias sources comprise a set of individually controlled electrical elements and a suppression voltage source, said individually controlled electrical elements connected between respective ones of said segments and said suppression voltage source.