| 摘要 |
Process installation (10), whereby in a tunnel passageway (16), arranged in between an upper block (12) and a lower block (14), transport and processing of wafers (18) takes place under double-floating condition, the tunnel wall of said blocks mainly consists of a plurality of recesses (20), having supply channels (32) extending therein and said recesses (20) are arranged aside discharge channels (26). |
