| 摘要 |
PROBLEM TO BE SOLVED: To improve antireflection by using a vapor deposition apparatus of a vertical type of a low cost by allowing a material to be deposited by evaporation which mainly consists of titanium oxide and zirconium oxide to fly in a horizontal direction and executing film deposition. SOLUTION: An evaporation source 6 and an electron gun 5 are longitudinally and perpendicularly installed and the electron beams from the electron gun 5 arrive at the evaporation source 6 by the effect of a magnetic field to heat the material to be deposited by evaporation which is held there. As a result, film diposition particle fluxes are generated. The axis 13 of the film deposition particle fluxes (the direction axis indicating the direction where the particle fluxes are most strongly generated) is directed sideways to allow the material to be deposited by evaporation to fly in the horizontal direction toward substrates 401 to 406 set on the inside walls of a vacuum vessel 1. The content of the titanium oxide in the material to be deposited by evaporation is preferably 5 to 30 wt.%. At least one layer of the thin films are preferably multilayer films consisting essentially of the titanium oxide and zirconium oxide. The multilayer films are antireflection films and the first layer thereof is preferably formed of the zirconium oxide. |
