FORMATION OF MASK PATTERN

摘要

PURPOSE:To provide the formation of the mask pattern which forms a mask material layer for thin film pattern formation by printing and prevents patterning precision from decreasing due to the peeling of the mask material layer and the penetration of an etchant. CONSTITUTION:When the mask pattern for forming a resist pattern on a substrate 15 to be processed where a thin film 15a to be patterned is formed is formed, resist 12 in a desired pattern is transferred to a roller 16 for printing and then resist 14 is transferred onto the resist 12; and the laminated resist 12 and resist 14 which are transferred to the roller 16 are printed on the thin film 15a.